Features of microwave photoconductance of quantum point contact and silicon field effect transistor
- Autores: Jaroshevich A.S.1, Tkachenko V.A.1,2, Kvon Z.D.1,2, Kuzmin N.S.2, Tkachenko O.A.1, Baksheev D.G.2, Marchishin I.V.1, Bakarov A.K.1, Rodyakina E.E.1,2, Antonov V.A.1, Popov V.P.1, Latyshev A.V.1,2
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Afiliações:
- Rzhanov Institute of Semiconductor Physics of the Siberian Branch of the Russian Academy of Sciences
- Novosibirsk State University
- Edição: Volume 88, Nº 9 (2024)
- Páginas: 1495–1502
- Seção: Quantum Optics and Quantum Technologies
- URL: https://edgccjournal.org/0367-6765/article/view/681839
- DOI: https://doi.org/10.31857/S0367676524090249
- EDN: https://elibrary.ru/OCDTLA
- ID: 681839
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Resumo
Quantum point contacts with a short (100 nm) channel in a high mobility two-dimensional electron gas of GaAs/Al(Ga)As heterostructures and a short-channel p-type field-effect transistor in a silicon-on-insulator structure were fabricated and studied experimentally and by modeling at the Institute of Semiconductor Physics of the Siberian Branch of the Russian Academy of Sciences in order to study the response of samples to weak irradiation by an electromagnetic field with a frequency of ~2 GHz. This response in the tunnel mode at a temperature of 4.2 K turned out to be gigantic and was observed against the background of features caused by impurity disorder.
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Sobre autores
A. Jaroshevich
Rzhanov Institute of Semiconductor Physics of the Siberian Branch of the Russian Academy of Sciences
Autor responsável pela correspondência
Email: jarosh@isp.nsc.ru
Rússia, Novosibirsk
V. Tkachenko
Rzhanov Institute of Semiconductor Physics of the Siberian Branch of the Russian Academy of Sciences; Novosibirsk State University
Email: jarosh@isp.nsc.ru
Rússia, Novosibirsk; Novosibirsk
Z. Kvon
Rzhanov Institute of Semiconductor Physics of the Siberian Branch of the Russian Academy of Sciences; Novosibirsk State University
Email: jarosh@isp.nsc.ru
Rússia, Novosibirsk; Novosibirsk
N. Kuzmin
Novosibirsk State University
Email: jarosh@isp.nsc.ru
Rússia, Novosibirsk
O. Tkachenko
Rzhanov Institute of Semiconductor Physics of the Siberian Branch of the Russian Academy of Sciences
Email: jarosh@isp.nsc.ru
Rússia, Novosibirsk
D. Baksheev
Novosibirsk State University
Email: jarosh@isp.nsc.ru
Rússia, Novosibirsk
I. Marchishin
Rzhanov Institute of Semiconductor Physics of the Siberian Branch of the Russian Academy of Sciences
Email: jarosh@isp.nsc.ru
Rússia, Novosibirsk
A. Bakarov
Rzhanov Institute of Semiconductor Physics of the Siberian Branch of the Russian Academy of Sciences
Email: jarosh@isp.nsc.ru
Rússia, Novosibirsk
E. Rodyakina
Rzhanov Institute of Semiconductor Physics of the Siberian Branch of the Russian Academy of Sciences; Novosibirsk State University
Email: jarosh@isp.nsc.ru
Rússia, Novosibirsk; Novosibirsk
V. Antonov
Rzhanov Institute of Semiconductor Physics of the Siberian Branch of the Russian Academy of Sciences
Email: jarosh@isp.nsc.ru
Rússia, Novosibirsk
V. Popov
Rzhanov Institute of Semiconductor Physics of the Siberian Branch of the Russian Academy of Sciences
Email: jarosh@isp.nsc.ru
Rússia, Novosibirsk
A. Latyshev
Rzhanov Institute of Semiconductor Physics of the Siberian Branch of the Russian Academy of Sciences; Novosibirsk State University
Email: jarosh@isp.nsc.ru
Rússia, Novosibirsk; Novosibirsk
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