Barrier Layers Based on Refractory Metals in Contacts of High Temperature Thermoelements

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An electrochemical method is proposed for forming contacts to high-temperature thermoelements with barrier layers based on refractory metal alloys. The contacts are intended for thermoelements with operating temperatures of up to 900 K. The barrier layers had a specific resistance of no more than 15.3 × 10–8 Ohm × m, and a specific contact resistance of no more than 1.5 × 10–9 Ohm m2. The best results were obtained for barrier layers based on Mo–Ni alloy with a Mo content of 36.5 wt. %. Ag films obtained by electrochemical deposition were used as a commutation layer in the contacts. It has been established that the contacts are thermally stable at the limiting operating temperatures of thermoelements and have an adhesive strength of at least 10.3 MPa.

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作者简介

E. Korchagin

National Research University of Electronic Technology

编辑信件的主要联系方式.
Email: eg.ad2013@yandex.ru
俄罗斯联邦, Moscow

Yu. Shtern

National Research University of Electronic Technology

Email: eg.ad2013@yandex.ru
俄罗斯联邦, Moscow

I. Petukhov

National Research University of Electronic Technology

Email: eg.ad2013@yandex.ru
俄罗斯联邦, Moscow

M. Shtern

National Research University of Electronic Technology

Email: eg.ad2013@yandex.ru
俄罗斯联邦, Moscow

M. Rogachev

National Research University of Electronic Technology

Email: rmaks1988@yahoo.com
俄罗斯联邦, Moscow

R. Ryazanov

National Research University of Electronic Technology; Technological Centre Scientific-Manufacturing Complex

Email: eg.ad2013@yandex.ru
俄罗斯联邦, Moscow; Moscow

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2. Fig. 1. SEM images of the surface of the films formed on Bi0.4Sb1.6Te3 samples.

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3. Fig. 2. SEM image of the spall of Bi0.4Sb1.6Te3 (a) and GeTe (b) samples with formed Ni-Mo/Ag contact system after annealing.

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4. Fig. 3. SEM image of element-by-element mapping of the chipped Bi0.4Sb1.6Te3 sample with formed Ni-Mo/Ag CW after annealing at 600 K: (a) Ag, (b) Ni, (c) Mo, (d) Te, (e) Sb, (f) Bi.

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5. Fig. 4. SEM image of the element-by-element mapping of the GeTe sample spall with the formed Ni-Mo/Ag CW after annealing at 900 K: (a) Ni, (b) Ag, (c) Te, (d) Ge.

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