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卷 54, 编号 3 (2025)
Features of upsets formation in VLSI under pulsed ionizing radiation
Chumakov A.
PDF
(Rus)
卷 54, 编号 2 (2025)
Regularities of X-ray transfer in doped multicomponent semiconductors for dosimetry
Asadov S., Mustafaeva S., Lukichev V.
PDF
(Rus)
卷 53, 编号 3 (2024)
The Effect оf Laser Radiation оn Functional Properties of MOS Structures
Rekhviashvili S., Gaev D.
PDF
(Rus)
卷 53, 编号 3 (2024)
Influence of Hydrogen Additive on Electrophysical Parameters and Emission Spectra of Tetrafluoromethane Plasma
Murin D., Grazhdyan A., Chesnokov I., Gogulev I.
PDF
(Rus)
卷 52, 编号 1 (2023)
Controlling Silicon Etching Parameters in RF CHF3 Plasma by Optical Emission Spectroscopy
Murin D., Chesnokov I., Pivovarenok S., Efremov A.
PDF
(Rus)
卷 53, 编号 4 (2024)
Plasmochemical and Reactive Ion Etching of Gallium Arsenide in Difluorodichloromethane with Helium
Murin D., Chesnokov I., Gogulev I., Anokhin A., Moloskin A.
PDF
(Rus)
卷 52, 编号 3 (2023)
Hydrogen Plasma under Conditions of Electron-Cyclotron Resonance in Microelectronics Technology
Polushkin E., Nefed’ev S., Koval’chuk A., Soltanovich O., Shapoval S.
PDF
(Rus)
卷 52, 编号 6 (2023)
OPTICALLY PUMPED BIPOLAR TRANSISTOR
Altudov Y., Gaev D., Pskhu A., Rekhviashvili S.
PDF
(Rus)
卷 52, 编号 6 (2023)
Electrophysical parameters of p-i-n photodiodes, irradiated with 60Co γ-quanta
Kovalchuk N., Lastovsky S., Odzhaev V., Petlitsky A., Prosolovich V., Shestovsky D., Yavid V., Yankovsky Y.
PDF
(Rus)
卷 52, 编号 6 (2023)
PROBE AND SPECTRAL DIAGNOSTICS OF PLASMA GAS ENVIRONMENT: BCl3-Cl2
Murin D., Chesnokov I., Gogulev I., Grishkov A.
PDF
(Rus)
卷 53, 编号 2 (2024)
The new approach of a simulation low dose rate radiation effects in bipolar integrated circuits
Chumakov A.
PDF
(Rus)
卷 53, 编号 5 (2024)
Electron cyclotron resonance plasma studies using the second cyclotron harmonic resonance
Kovalchuk А., Shapoval S.
PDF
(Rus)
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